Innovative Solutions for Electron, Ion, and X-ray Beam Imaging
Beam Imaging Solutions is dedicated to new innovative imaging solutions for particle and photon (UV, X-ray) beams and offers a wide range of imaging products to fit your particular application and budget. Our products range from stand alone phosphor screens to high resolution beam imaging systems with 2-D and 3-D imaging capabilities. We specialize in microchannel plate (MCP) and phosphor screen based imaging arrays for imaging ion, electron and neutral beams as well as X-rays and UV. Microchannel plate detector assemblies are also available. Beam Imaging Solutions also offers ion beam deflectors (quadrupole) , faraday cups and ion sources.
BOS-25-IW 25mm Image Wedge
The new BOS-25-IW is available with 25mm diameter remote imaging capability to compliment the existing image wedge line (BOS-18-IW (18mm), BOS-40-IW (40mm) and BOS-75-IW (75mm)). Please see the BOS-25-IW page for more information.
Colutron Type Ion Gun Systems, Ion Sources, and Spare Parts Now Available!
Colutron type ion guns Systems for generating mass separated ion beams with low energy spread from less than 1eV up to 20keV are now also available. Colutron type ion sources including the legacy quartz. boron nitride, and new ceramic models are also now available through Beam Imaging Solutions.Technical support for the Colutron systems are also available. Please see our contacts page for contact information.
Standard Product Synopsis
The Beam Observation Systems (BOS) offer a quick, easy, and low cost solution for beam beam profile analysis and particle detection. The BOS systems are compact flange mount systems with viewport and integrated MCP and phosphor screen assemblies. Currently, three different size BOS imagers are available. The BOS-18, BOS-25, BOS-40, and BOS-75 which have active areas of 18mm, 25mm, 40mm, and 75mm diameter respectively.
High image resolution on the micron level can be achieved with our coherent fiber optic based HRBIS systems. These systems confine the photons created at the the phosphor screen within individual micron sized optical fibers which are rigidly bundled in an ordered fashion on the input and output end, all the way to the digital camera imaging sensor. These systems are multi-configurable with interchangeable components that allow the user to image a wide dynamic range of particle energies and flux, as well as a wide range of imaging areas. An optional 60cm long flexible fiber optic bundle allows for imaging three dimensional beam profiles as well as remote imaging deep inside the vacuum chamber.
Phosphor screens are available in a wide range of configurations and types to support a wide range of applications. Standard phosphor screens used in Beam Imaging Solutions products are available as stock items, as well as custom phosphor screens which can be specified and special ordered by the customer.
ION BEAM EQUIPMENT
Ion sources for the Colutron type ion gun systems. Both an RF and DC (filament) ion sources (quartz and ceramic models) and spare parts are now available from Beam Imaging Solutions. Complete ion gun systems with controllers are also available. Components of the ion gun such as the velocity filter for mass separating the ion beam, lens system for extracting and focussing the beam as well as the ion beam decelerator are available separately.
A Quadrupole Ion Deflector that can be used for applications such as beam line switching or merged beams experiments is also available from Beam Imaging Solutions. The quadrupole has additional electrostatic focus optics that enable the instrument to deflect an ion beam without the inherent cylindrical focus property common with this type of deflector.
A Faraday Cup for electron beams and positive ion beams. This Faraday cup uses permanent magnets to prevent electrons from electron neutralization sources, secondary electrons from primary beam scattering, and electrons from ionization gauges from entering the cup. The cup is also designed to reject low energy ions from charge exchange collisions and to repress secondary electron emission generated from within the cup thereby allowing for highly accurate measurements of the primary ion beam current.