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Innovative Solutions for Electron, Ion, and X-ray Beam Imaging

Beam Imaging Solutions is dedicated to new innovative imaging solutions for particle and photon (UV, X-ray) beams and offers a wide range of imaging products to fit your particular application and budget. Our products range from stand alone phosphor screens to high resolution beam imaging systems with 2-D and 3-D imaging capabilities.  We specialize in microchannel plate (MCP) and phosphor screen based imaging arrays for imaging ion, electron and neutral beams as well as X-rays and UV. Microchannel plate detector assemblies are also available. Beam Imaging Solutions is currently expanding its product line to include ion beam deflectors, faraday cups and ion sources.

                         RF-100, Ion Source Assembly NEW!

                    

Beam Imaging Solutions will introduce this Fall, 2010, the new RF-100 Ion Source Assembly. The RF ion source is mounted to a standard 6" conflat flange and will produce an inductively coupled plasma with a water cooled antenna at operating at 13.56MHz and up to 500W power. The source has a 1" diameter Al2O3 discharge chamber with single aperture molybdenum end plate from which a single ion beamlet can be extracted. The source is designed to retrofit to the standard Colutron Research Corporation ion gun platform, but can also be used with customer supplied beam extraction and focus optics. The new source will soon also have the added capability of being used to produce high current electron beams for broad ion beam charge neutralization applications. Please see the RF-100 Ion Source link for more information.

 

             

Standard Product Synopsis

• Phosphor screens are available in a wide range of configurations and types to support a wide range of applications. Standard phosphor screens used in Beam Imaging Solutions products are available as stock items, as well as custom phosphor screens which can be specified and special ordered by the customer.

• The Beam Observation Systems (BOS)  offer a quick, easy, and low cost solution for beam beam profile analysis and particle detection. The BOS systems are compact flange mount systems with viewport and integrated MCP and phosphor screen assemblies. Currently, three different size BOS imagers are available. The BOS-18, BOS-25, BOS-40, and BOS-75 which have active areas of 18mm, 25mm, 40mm, and 75mm diameter respectively.  

• The Beam Detection Systems (BDS)  systems are now available for particle beam detection applications. The BDS systems are compact flange mount systems with integrated MCP and metal anode assemblies. These units are based on the BOS (Beam Observation System) platforms in which a metal anode is used in place of the phosphor screen. The anode is connected via a 50 ohm UHV compatible coax cable and BNC feedthrough. Flange mount assemblies are available as well as stand alone MCP/anode assemblies.

• High image resolution on the micron level can be  achieved with our coherent fiber optic based HRBIS systems. These systems confine the photons created at the the phosphor screen within individual micron sized optical fibers which are rigidly bundled in an ordered fashion on the input and output end, all the way to the digital camera imaging sensor. These systems are multi-configurable with interchangeable components that allow the user to image a wide dynamic range of particle energies and flux, as well as a wide range of imaging areas. An optional 60cm long flexible fiber optic bundle allows for imaging three dimensional beam profiles as well as remote imaging deep inside the vacuum chamber.

• A Quadrupole Ion Deflector that can be used for applications such as beam line switching or merged beams experiments is also available from Beam Imaging Solutions. The quadrupole has additional electrostatic focus optics that enable the instrument to deflect an ion beam without the inherent cylindrical focus property common with this type of deflector. 

• A Faraday Cup for positive ion beams. This Faraday cup uses permanent magnets to prevent electrons from electron neutralization sources, secondary electrons from primary beam scattering, and electrons from ionization gauges from entering the cup. The cup is also designed to reject low energy ions from charge exchange collisions and to repress secondary electron emission generated from within the cup thereby allowing for highly accurate measurements of the primary ion beam current.

• A RF ion source for positive and negative ion beams. Beam Imaging Solutions is currently working on a new RF ion source. The new source will be retrofittable to the Colutron® model G-1 and G-2 ion gun systems.

© 2010 Beam Imaging Solutions Inc.